The role of the Ge mole fraction in improving the performance of a nanoscale junctionless tunneling FET: concept and scaling capability

• Hichem Ferhati,
• Fayçal Djeffal and
• Toufik Bentrcia

Beilstein J. Nanotechnol. 2018, 9, 1856–1862, doi:10.3762/bjnano.9.177

• transistor (DG-JL TFET) based on a Si1−xGex/Si/Ge heterojunction (HJ) structure is proposed to achieve an improved electrical performance. The effect of introducing the Si1−xGex material at the source side on improving the subthreshold behavior of the DG-JL TFET and on suppressing ambipolar conduction is

• , where the optimized design exhibits an improved switching behavior at the nanoscale level. These results make the optimized device suitable for designing digital circuit for high-performance nanoelectronic applications. Keywords: ambipolar conduction; heterojunctions; junctionless tunneling field

• properties, DG TFETs still suffer from other issues mainly related to the relatively low ON-state current and the severe ambipolar conduction, which make it extremely challenging for designing high-performance digital nanocircuits [7][8][9]. Consequently, intensive efforts have been paid to address these